Researchers and responsibles of the EU-funded project NAPANIL, celebrated an information day during which people at the event explored the potentials, limitations and expected impact of nanoimprint lithography (NIL) on the market.

The recent NAPANIL Industrial Day, a project that has received €11.8 million under the 'Nanosciences, nanotechnologies, materials and new production technologies' (NMP) Theme of the EU's Seventh Framework Programme (FP7), was recently celebrating providing an effective platform for professionals in technology and industrial players to share their diverse, yet complementary perspectives on limitations and expected impact of nanoimprint lithography (NIL).

Experts and attendees to this information day had the opportunity to explore the potentials, limitations and expected impact of nanoimprint lithography (NIL) on the market. NIL is a high-throughput, high-resolution parallel patterning method for applications that ranges from patterned magnetic media to optical devices. A surface pattern of a stamp is replicated into a material, forming complex three-dimensional nanostructures to be formed in various materials.

Among the conclusions of this information day, attendees highlighted that the most successful achievement was generating interest as well as being an effective platform for professionals in technology and industrial players. What stood out for them were the new collaborations that have been created as a result of the networking activities as well as the recognition that nanoimprint lithography was receiving, so much so that they hoped that the Industrial Day would be repeated in the future.